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| Field | Value |
| Title | RF sputter deposited nanocrystalline (110) magnetite thin film from alpha-Fe2O3 target |
| Names |
BOHRA, M
(author) VENKATARAMANI, N (author) PRASAD, S (author) KUMAR, N (author) MISRA, DS (author) SAHOO, SC (author) KRISHNAN, R (author) |
| Date Issued | 2007 (iso8601) |
| Abstract | Nanocrystalline magnetite thin film was prepared on to fused quartz substrate by sputtering at an rf power of 50 W. X-ray diffraction study showed that the sputtered film was (110) oriented. The stoichiometry in the thin film has been confirmed through a variety of characterization techniques. The room temperature spontaneous magnetization value (4 pi M-s) of the film was 5100 G. This is about 85% of the bulk value. The resistivity of the film showed a sharp change around 120 K, indicative of the Verwey transition. |
| Genre | Article; Proceedings Paper |
| Topic | ray photoelectron-spectroscopy |
| Identifier | 1533-4880 |
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