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Optimisation of the new time-modulated CVD process using the Taguchi method

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Title Optimisation of the new time-modulated CVD process using the Taguchi method
 
Creator ALI, N
NETO, F
MEI, S
CABRAL, G
KOUSAR, Y
TITUS, E
OGWU, AA
MISRA, DS
GRACIO, J
 
Subject nanocrystalline diamond films
chemical-vapor-deposition
microwave plasma
thin-films
growth
nucleation
fabrication
coatings
regime
taguchi
process optimisation
experimental design
cvd diamond
 
Description In this paper, we employ the Taguchi method to optimise our newly developed time-modulated chemical vapour deposition (TMCVD) process. TMCVD can be used to deposit smoother, nanocrystalline diamond (NCD) coatings onto a range of substrate materials. The implementation of the Taguchi method to optimise the TMCVD process can effectively save valuable time, considerable effort and money, this being the major advantage of the method. The Taguchi method significantly reduces the number of experiments required to optimise a fabrication process. In this study, we investigate the effect of five TMCVD process parameters on five key factors of the as-grown samples. Each parameter was varied at four different values (experimental levels). The 5 considered parameters, taking into consideration the experimental levels, were optimised after performing only 16 experiments. The as-grown films were characterised for hardness, quality, surface roughness and microstructure using SEM, Raman spectroscopy, surface profilometry and Vickers hardness testing. (C) 2004 Elsevier B.V. All rights reserved.
 
Publisher ELSEVIER SCIENCE SA
 
Date 2011-10-23T07:37:32Z
2011-12-15T09:11:03Z
2011-10-23T07:37:32Z
2011-12-15T09:11:03Z
2004
 
Type Article; Proceedings Paper
 
Identifier THIN SOLID FILMS,469,154-160
0040-6090
http://dx.doi.org/10.1016/j.tsf.2004.08.074
http://dspace.library.iitb.ac.in/xmlui/handle/10054/15067
http://hdl.handle.net/100/1818
 
Source 31st International Conference on Metallurgical Coatings and Thin Films,San Diego, CA,APR 19-23, 2004
 
Language English