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Low temperature deposition of beta-phase Silicon Nitride using inductively coupled plasma chemical vapor deposition technique

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Title Low temperature deposition of beta-phase Silicon Nitride using inductively coupled plasma chemical vapor deposition technique
 
Creator KSHIRSAGAR, A
DUTTAGUPTA, SP
GANGAL, SA
 
Subject ceramics
raman
thin films
mems
plasma
xrd
raman spectroscopy
 
Description Silicon nitride (SiN) films have been deposited at low temperature (
 
Publisher AMER INST PHYSICS
 
Date 2011-10-23T12:21:13Z
2011-12-15T09:11:09Z
2011-10-23T12:21:13Z
2011-12-15T09:11:09Z
2010
 
Type Proceedings Paper
 
Identifier INTERNATIONAL CONFERENCE ON PHYSICS OF EMERGING FUNCTIONAL MATERIALS (PEFM-2010),1313,165-167
978-0-7354-0868-5
0094-243X
http://dspace.library.iitb.ac.in/xmlui/handle/10054/15128
http://hdl.handle.net/100/1883
 
Source International Conference on Physics of Emerging Functional Materials,Mumbai, INDIA,SEP 22-24, 2010
 
Language English