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Characterization and simulation of lateral asymmetric channel silicon-on-insulator MOSFETs

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Title Characterization and simulation of lateral asymmetric channel silicon-on-insulator MOSFETs
 
Creator NAJEEB-UD-DIN
RAO, VR
VASI, J
 
Subject cmos
soi
 
Description This paper presents the characterization and simulation results of Lateral Asymmetric Channel (LAC) doped Silicon-on-Insulator (SOI) MOSFETs. The results are compared with uniformly doped SOI MOSFETs. It is shown that these LAC devices have better characteristics with many advantages.
 
Publisher SPIE-INT SOC OPTICAL ENGINEERING
 
Date 2011-10-23T22:01:43Z
2011-12-15T09:11:11Z
2011-10-23T22:01:43Z
2011-12-15T09:11:11Z
2002
 
Type Proceedings Paper
 
Identifier PROCEEDINGS OF THE ELEVENTH INTERNATIONAL WORKSHOP ON THE PHYSICS OF SEMICONDUCTOR DEVICES, VOL 1 & 2,4746,644-648
0-8194-4500-2
0277-786X
http://dspace.library.iitb.ac.in/xmlui/handle/10054/15249
http://hdl.handle.net/100/1904
 
Source 11th International Workshop on the Physics of Semiconductor Devices,New Delhi, INDIA,DEC 11-15, 2001
 
Language English