Record Details

Channel engineering for sub-micron CMOS technologies

DSpace at IIT Bombay

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Field Value
 
Title Channel engineering for sub-micron CMOS technologies
 
Creator DIXIT, A
PAL, DK
ROY, JN
RAO, VR
 
Subject mosfet
 
Description In this work, we have applied channel-engineering strategies for the Semiconductor Complex Limited (SCL) 0.8 mum CMOS process and studied the performance advantages using extensive 2-D device simulations. Our results clearly indicate that, with minimum adjustments to the process flow, one can achieve improved performance by appropriate choice of channel engineering techniques.
 
Publisher SPIE-INT SOC OPTICAL ENGINEERING
 
Date 2011-10-23T22:12:33Z
2011-12-15T09:11:12Z
2011-10-23T22:12:33Z
2011-12-15T09:11:12Z
2002
 
Type Proceedings Paper
 
Identifier PROCEEDINGS OF THE ELEVENTH INTERNATIONAL WORKSHOP ON THE PHYSICS OF SEMICONDUCTOR DEVICES, VOL 1 & 2,4746,637-640
0-8194-4500-2
0277-786X
http://dspace.library.iitb.ac.in/xmlui/handle/10054/15251
http://hdl.handle.net/100/1914
 
Source 11th International Workshop on the Physics of Semiconductor Devices,New Delhi, INDIA,DEC 11-15, 2001
 
Language English