Record Details

Comparison of negative bias temperature instability in HfSiO(N)/TaN and SiO(N)/poly-Si pMOSFETs

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Title Comparison of negative bias temperature instability in HfSiO(N)/TaN and SiO(N)/poly-Si pMOSFETs
 
Creator MAHETA, VD
PURAWAT, S
GUPTA, G
 
Subject mosfets
 
Publisher IEEE
 
Date 2011-10-26T03:55:27Z
2011-12-15T09:11:48Z
2011-10-26T03:55:27Z
2011-12-15T09:11:48Z
2007
 
Type Proceedings Paper
 
Identifier IPFA 2007: PROCEEDINGS OF THE 14TH INTERNATIONAL SYMPOSIUM ON THE PHYSICAL & FAILURE ANALYSIS OF INTEGRATED CIRCUITS,91-95
978-1-4244-1014-9
http://dspace.library.iitb.ac.in/xmlui/handle/10054/15902
http://hdl.handle.net/100/2298
 
Source 14th International Symposium on the Physical and Failure Analysis of Integrated Circuits,Bangalore, INDIA,JUL 11-13, 2007
 
Language English