Comparison of negative bias temperature instability in HfSiO(N)/TaN and SiO(N)/poly-Si pMOSFETs
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Title |
Comparison of negative bias temperature instability in HfSiO(N)/TaN and SiO(N)/poly-Si pMOSFETs
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Creator |
MAHETA, VD
PURAWAT, S GUPTA, G |
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Subject |
mosfets
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Publisher |
IEEE
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Date |
2011-10-26T03:55:27Z
2011-12-15T09:11:48Z 2011-10-26T03:55:27Z 2011-12-15T09:11:48Z 2007 |
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Type |
Proceedings Paper
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Identifier |
IPFA 2007: PROCEEDINGS OF THE 14TH INTERNATIONAL SYMPOSIUM ON THE PHYSICAL & FAILURE ANALYSIS OF INTEGRATED CIRCUITS,91-95
978-1-4244-1014-9 http://dspace.library.iitb.ac.in/xmlui/handle/10054/15902 http://hdl.handle.net/100/2298 |
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Source |
14th International Symposium on the Physical and Failure Analysis of Integrated Circuits,Bangalore, INDIA,JUL 11-13, 2007
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Language |
English
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