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Characterization of multiferroic thin films directly deposited on silicon for novel device applications

DSpace at IIT Bombay

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Title Characterization of multiferroic thin films directly deposited on silicon for novel device applications
 
Creator PRASHANTHI, K
PALKAR, VR
 
Description we have investigated the multiferroic and dielectric properties in Dy modified BiFeO(3) thin films deposited directly on silicon using pulsed laser deposition (PLD) technique. The results support the usability of these films in multiferroic based MEMS devices as well as gate dielectrics for future CMOS applications.
 
Publisher IEEE
 
Date 2011-10-25T14:12:46Z
2011-12-15T09:11:58Z
2011-10-25T14:12:46Z
2011-12-15T09:11:58Z
2010
 
Type Proceedings Paper
 
Identifier INEC: 2010 3RD INTERNATIONAL NANOELECTRONICS CONFERENCE, VOLS 1 AND 2,900-901
978-1-4244-3543-2
http://dspace.library.iitb.ac.in/xmlui/handle/10054/15742
http://hdl.handle.net/100/2398
 
Source 3rd IEEE International Nanoelectronics Conference,Hong Kong, PEOPLES R CHINA,JAN 03-08, 2010
 
Language English