Characterization of multiferroic thin films directly deposited on silicon for novel device applications
DSpace at IIT Bombay
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Title |
Characterization of multiferroic thin films directly deposited on silicon for novel device applications
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Creator |
PRASHANTHI, K
PALKAR, VR |
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Description |
we have investigated the multiferroic and dielectric properties in Dy modified BiFeO(3) thin films deposited directly on silicon using pulsed laser deposition (PLD) technique. The results support the usability of these films in multiferroic based MEMS devices as well as gate dielectrics for future CMOS applications.
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Publisher |
IEEE
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Date |
2011-10-25T14:12:46Z
2011-12-15T09:11:58Z 2011-10-25T14:12:46Z 2011-12-15T09:11:58Z 2010 |
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Type |
Proceedings Paper
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Identifier |
INEC: 2010 3RD INTERNATIONAL NANOELECTRONICS CONFERENCE, VOLS 1 AND 2,900-901
978-1-4244-3543-2 http://dspace.library.iitb.ac.in/xmlui/handle/10054/15742 http://hdl.handle.net/100/2398 |
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Source |
3rd IEEE International Nanoelectronics Conference,Hong Kong, PEOPLES R CHINA,JAN 03-08, 2010
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Language |
English
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