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The high field magnetization in the RF sputter deposited copper ferrite thin films

DSpace at IIT Bombay

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Title The high field magnetization in the RF sputter deposited copper ferrite thin films
 
Creator KULKARNI, PD
PRASAD, S
VENKATARAMANI, N
KRISHNAN, R
PANG, WJ
GUHA, A
WOODWARD, RC
STAMPS, RL
 
Description Copper ferrite thin films were deposited on amorphous quartz substrates. The as deposited films were annealed in air and either quenched or slow cooled. Magnetization studies were carried out on the as deposited as well as annealed films using a SQUID magnetometer. The M-H curves were measured up to a field of 7T, at temperatures varying from 5K to 300K. The magnetization in the films did not saturate, even at the highest field. The expression, M(H)= Q(1- a /H(n)) fitted the approach to saturation best with n=:1/2, for all films and at all temperatures. The coefficient a was the highest for the as deposited film and was the smallest for the quenched film. In the case of as deposited film, the value of coefficient a increased with increasing temperature, while for the annealed films, the value of a showed a decrease as temperature increases.
 
Publisher AMER CERAMIC SOC
 
Date 2011-10-26T17:04:05Z
2011-12-15T09:12:25Z
2011-10-26T17:04:05Z
2011-12-15T09:12:25Z
2005
 
Type Proceedings Paper
 
Identifier NINTH INTERNATIONAL CONFERENCE ON FERRITES (ICF-9),201-205
1-57498-218-4
http://dspace.library.iitb.ac.in/xmlui/handle/10054/16068
http://hdl.handle.net/100/2658
 
Source 9th International Conference on Ferrites (ICF-9),San Francisco, CA,AUG 22-27, 2004
 
Language English