Field emission from carbon nanotubes: a comparative study between the carbon nanotubes synthesized by thermal and microwave plasma chemical vapor deposition
DSpace at IIT Bombay
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Title |
Field emission from carbon nanotubes: a comparative study between the carbon nanotubes synthesized by thermal and microwave plasma chemical vapor deposition
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Creator |
RAI, PADMNABH
MOHAPATRA, DIPTI R MISRA, ABHA MISRA, DS |
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Subject |
carbon nanotubes
field emission iron nanotechnology plasma cvd silicon vacuum deposition |
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Description |
The carbon nanotubes (CNTs) samples are grown using the microwave plasma chemical vapor deposition (MPCVD) and thermal chemical vapor deposition (THCVD) technique on Fe catalyst deposited by thermal evaporation on silicon substrate. The field emission measurements of the samples have been made in a diode assembly at room temperature in a vacuum chamber with a base pressure of 10-7 mbar. The turn-on fields of CNT films grown by THCVD and MPCVD techniques are 0.6 and 1.0 V/mum, respectively.
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Publisher |
IEEE
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Date |
2009-04-28T05:24:19Z
2011-11-28T07:45:35Z 2011-12-15T09:57:12Z 2009-04-28T05:24:19Z 2011-11-28T07:45:35Z 2011-12-15T09:57:12Z 2007 |
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Type |
Article
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Identifier |
Proceedings of the IEEE International Workshop on Physics of Semiconductor Devices, Mumbai, India, 16-20 December 2007, 834 - 835
978-1-4244-1728-5 10.1109/IWPSD.2007.4472649 http://hdl.handle.net/10054/1253 http://dspace.library.iitb.ac.in/xmlui/handle/10054/1253 |
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Language |
en
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