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Field emission from carbon nanotubes: a comparative study between the carbon nanotubes synthesized by thermal and microwave plasma chemical vapor deposition

DSpace at IIT Bombay

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Title Field emission from carbon nanotubes: a comparative study between the carbon nanotubes synthesized by thermal and microwave plasma chemical vapor deposition
 
Creator RAI, PADMNABH
MOHAPATRA, DIPTI R
MISRA, ABHA
MISRA, DS
 
Subject carbon nanotubes
field emission
iron
nanotechnology
plasma cvd
silicon
vacuum deposition
 
Description The carbon nanotubes (CNTs) samples are grown using the microwave plasma chemical vapor deposition (MPCVD) and thermal chemical vapor deposition (THCVD) technique on Fe catalyst deposited by thermal evaporation on silicon substrate. The field emission measurements of the samples have been made in a diode assembly at room temperature in a vacuum chamber with a base pressure of 10-7 mbar. The turn-on fields of CNT films grown by THCVD and MPCVD techniques are 0.6 and 1.0 V/mum, respectively.
 
Publisher IEEE
 
Date 2009-04-28T05:24:19Z
2011-11-28T07:45:35Z
2011-12-15T09:57:12Z
2009-04-28T05:24:19Z
2011-11-28T07:45:35Z
2011-12-15T09:57:12Z
2007
 
Type Article
 
Identifier Proceedings of the IEEE International Workshop on Physics of Semiconductor Devices, Mumbai, India, 16-20 December 2007, 834 - 835
978-1-4244-1728-5
10.1109/IWPSD.2007.4472649
http://hdl.handle.net/10054/1253
http://dspace.library.iitb.ac.in/xmlui/handle/10054/1253
 
Language en