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GROWTH AND MICROSTRUCTURAL STUDY OF RADIO-FREQUENCY MAGNETRON SPUTTERED MGO FILMS ON SILICON

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Title GROWTH AND MICROSTRUCTURAL STUDY OF RADIO-FREQUENCY MAGNETRON SPUTTERED MGO FILMS ON SILICON
 
Creator PINTO, R
POOTHRA, JI
PURANDARE, SC
PAI, SP
DSOUZA, CP
KUMAR, D
SHARON, M
 
Subject superconducting thin-films
epitaxial-growth
oxide
evaporation
coatings
insitu
 
Description Microstructure of magnesium oxide films radio frequency (rf) sputtered on silicon substrates at various argon: oxygen (9:1) gas pressures in the range 1-6.7 Pa and at various substrate temperatures up to 700-degrees-C have been studied using x-ray diffraction and scanning electron microscopy. The films have shown a tendency for oriented structure with growth orientation perpendicular to the planes. The tendency for columnar growth has been found to be strong at high argon pressures and has been found to persist to higher substrate temperatures. This observation is consistent with the structure zone model proposed by Movchan and Demchishin [Phys. Met. Mettallogr. 28, 83 (1969)] and later studied by Thornton [J. Vac. Sci. Technol. 11, 666 (1974)]. Annealing of films at 900-degrees-C in oxygen which is needed to reduce oxygen deficiencies and strain generated during growth, and to improve crystallinity by increasing grain size, has been found to cause microcracks in the films depending upon the microstructure and thickness. Films with columnar structure have shown microcracks and the threshold thickness at which microcracks develop has been found to be strongly dependent on the nature of the columnar structure. Dense MgO films deposited at 600-degrees-C at a low pressure of 1 Pa have not shown microcracks upto a thickness of 600 nm. Such films should be potentially applicable as buffer layers for the growth of high quality Y1Ba2Cu3O7-delta films on silicon.
 
Publisher AMER INST PHYSICS
 
Date 2011-07-15T19:01:40Z
2011-12-26T12:49:37Z
2011-12-27T05:35:04Z
2011-07-15T19:01:40Z
2011-12-26T12:49:37Z
2011-12-27T05:35:04Z
1991
 
Type Article
 
Identifier JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 9(5), 2670-2674
0734-2101
http://dx.doi.org/10.1116/1.577222
http://dspace.library.iitb.ac.in/xmlui/handle/10054/4349
http://hdl.handle.net/10054/4349
 
Language en