Record Details

HYDROGENATED MICROCRYSTALLINE SILICON FILMS PRODUCED AT LOW-TEMPERATURE BY THE HOT-WIRE DEPOSITION METHOD

DSpace at IIT Bombay

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Field Value
 
Title HYDROGENATED MICROCRYSTALLINE SILICON FILMS PRODUCED AT LOW-TEMPERATURE BY THE HOT-WIRE DEPOSITION METHOD
 
Creator DUSANE, RO
DUSANE, SR
BHIDE, VG
KSHIRSAGAR, ST
 
Subject chemical vapor-deposition
amorphous-silicon
thin-films
quality
 
Description In this letter we report the synthesis of hydrogenated microcrystalline silicon at low temperature and without hydrogen dilution of the silane gas by the hot wire method. These films are characterized by higher dark conductivity and larger band gap compared to hydrogenated amorphous silicon. Microcrystallinity in these films is clearly established from the sharp crystalline TO-like peak in the first-order Raman spectra. The crystallite size and its volume fraction show a critical dependence on the silane flow rate.
 
Publisher AMER INST PHYSICS
 
Date 2011-07-16T07:19:08Z
2011-12-26T12:49:38Z
2011-12-27T05:35:12Z
2011-07-16T07:19:08Z
2011-12-26T12:49:38Z
2011-12-27T05:35:12Z
1993
 
Type Article
 
Identifier APPLIED PHYSICS LETTERS, 63(16), 2201-2203
0003-6951
http://dx.doi.org/10.1063/1.110801
http://dspace.library.iitb.ac.in/xmlui/handle/10054/4360
http://hdl.handle.net/10054/4360
 
Language en