SEMINUMERICAL SIMULATION OF DISPERSIVE TRANSPORT IN THE OXIDE OF METAL-OXIDE-SEMICONDUCTOR DEVICES
DSpace at IIT Bombay
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Title |
SEMINUMERICAL SIMULATION OF DISPERSIVE TRANSPORT IN THE OXIDE OF METAL-OXIDE-SEMICONDUCTOR DEVICES
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Creator |
LATHI, S
DAS, A |
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Subject |
interface trap formation
silicon dioxide radiation solids |
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Publisher |
AMER INST PHYSICS
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Date |
2011-07-16T14:10:46Z
2011-12-26T12:49:48Z 2011-12-27T05:35:32Z 2011-07-16T14:10:46Z 2011-12-26T12:49:48Z 2011-12-27T05:35:32Z 1995 |
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Type |
Article
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Identifier |
JOURNAL OF APPLIED PHYSICS, 77(8), 3864-3867
0021-8979 http://dx.doi.org/10.1063/1.358564 http://dspace.library.iitb.ac.in/xmlui/handle/10054/4447 http://hdl.handle.net/10054/4447 |
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Language |
en
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