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SEMINUMERICAL SIMULATION OF DISPERSIVE TRANSPORT IN THE OXIDE OF METAL-OXIDE-SEMICONDUCTOR DEVICES

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Field Value
 
Title SEMINUMERICAL SIMULATION OF DISPERSIVE TRANSPORT IN THE OXIDE OF METAL-OXIDE-SEMICONDUCTOR DEVICES
 
Creator LATHI, S
DAS, A
 
Subject interface trap formation
silicon dioxide
radiation
solids
 
Publisher AMER INST PHYSICS
 
Date 2011-07-16T14:10:46Z
2011-12-26T12:49:48Z
2011-12-27T05:35:32Z
2011-07-16T14:10:46Z
2011-12-26T12:49:48Z
2011-12-27T05:35:32Z
1995
 
Type Article
 
Identifier JOURNAL OF APPLIED PHYSICS, 77(8), 3864-3867
0021-8979
http://dx.doi.org/10.1063/1.358564
http://dspace.library.iitb.ac.in/xmlui/handle/10054/4447
http://hdl.handle.net/10054/4447
 
Language en