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The effect of deposition and annealing conditions on textured growth of sputter-deposited strontium ferrite films on different substrates

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Title The effect of deposition and annealing conditions on textured growth of sputter-deposited strontium ferrite films on different substrates
 
Creator ACHARYA, BR
PRASAD, S
VENKATARAMANI, N
SHRINGI, SN
KRISHNAN, R
 
Subject thin-films
anisotropy
inplane
media
 
Description M-type strontium ferrite films were prepared by radio-frequency (rf) sputtering on fused quartz substrates using different deposition conditions and were subjected to two different types of annealing treatments. The study showed that in addition to the deposition conditions such as rf power, oxygen to argon ratio in the sputtering gas, and target to substrate distance, the postdeposition annealing conditions also play an important role in determining the texture and properties of the films. The films with random orientation or with preferred c-axis orientation either normal to the film plane or in the film plane could be deposited depending on the process parameters chosen. The study carried out by depositing these films on different substrates such as Si(100), Si(111), sapphire(110), and Gd3Ga5O12(111) showed that though the nature of the substrates plays a role in determining the texture and properties of the films, such effects are less dominant in comparison to the effect of deposition and annealing conditions in the case of strontium ferrite films. (C) 1996
 
Publisher AMER INST PHYSICS
 
Date 2011-07-16T17:34:27Z
2011-12-26T12:49:52Z
2011-12-27T05:35:39Z
2011-07-16T17:34:27Z
2011-12-26T12:49:52Z
2011-12-27T05:35:39Z
1996
 
Type Article
 
Identifier JOURNAL OF APPLIED PHYSICS, 79(1), 478-484
0021-8979
http://dx.doi.org/10.1063/1.360854
http://dspace.library.iitb.ac.in/xmlui/handle/10054/4479
http://hdl.handle.net/10054/4479
 
Language en