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Thermal stability of 2.4 nm period Ni-Nb/C multilayer x-ray mirror

DSpace at IIT Bombay

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Title Thermal stability of 2.4 nm period Ni-Nb/C multilayer x-ray mirror
 
Creator VITTA, S
YANG, P
 
Subject reflectivity
scattering
 
Description The structure of Ni-Nb/C multilayers as a function of annealing at 200 and 320 degreesC has been studied. The layered structure is found to be extremely stable even after annealing at 320 degreesC. The interdiffused layer present at the two interfaces Ni1/2Nb1/2/C and C/Ni1/2Nb1/2 before annealing undergoes a reverse diffusion on annealing leading to an increase in repeat unit thickness as well as reflectivity enhancement. The repeat unit thickness increases from 2.36 to 2.56 nm and the reflectivity at the first order peak increases by 5 times after annealing at 320 degreesC. Only the Ni1/2Nb1/2 layers in the multilayer undergo a crystalline transformation into an equilibrium NiNb compound without increasing the interface roughness. (C) 2000 [S0003-6951(00)01748-4].
 
Publisher AMER INST PHYSICS
 
Date 2011-07-16T17:54:07Z
2011-12-26T12:49:53Z
2011-12-27T05:35:40Z
2011-07-16T17:54:07Z
2011-12-26T12:49:53Z
2011-12-27T05:35:40Z
2000
 
Type Article
 
Identifier APPLIED PHYSICS LETTERS, 77(22), 3654-3656
0003-6951
http://dx.doi.org/10.1063/1.1328761
http://dspace.library.iitb.ac.in/xmlui/handle/10054/4485
http://hdl.handle.net/10054/4485
 
Language en