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Human serum albumin (HSA) adsorption onto a-SiC : H thin films deposited by hot wire chemical vapor deposition

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Title Human serum albumin (HSA) adsorption onto a-SiC : H thin films deposited by hot wire chemical vapor deposition
 
Creator SWAIN, BP
 
Subject tissue-culture polystyrene
amorphous-silicon carbide
vitronectin
fibrinogen
surfaces
attachment
interface
binding
hwcvd
hwcvd
ftir
xps
afm
contact angle
 
Description In the present paper, we report the study of the adsorption behavior of human serum albumin (HSA) onto surfaces of a-SiC:H thin films deposited by using the hot wire chemical vapor deposition (HWCVD) technique. The surface composition and surface energy of the various substrates as well as the evaluation of the adsorbed amount of protein has been carried out by means of X-ray photoelectron spectroscopy (XPS), Fourier transform infra-red (FTIR) spectroscopy, AFM and contact angle measurements. At the immediate effect of HSA interaction with a-SiC:H films N is adsorbed on the surface and stabilized after 3 days. Preliminary observation found that Si and O atom are desorbed from the surface while C and N set adsorbed to the surface of the a-SiC:H film. (c) 2006
 
Publisher ELSEVIER SCIENCE BV
 
Date 2011-07-25T06:06:54Z
2011-12-26T12:50:00Z
2011-12-27T05:35:54Z
2011-07-25T06:06:54Z
2011-12-26T12:50:00Z
2011-12-27T05:35:54Z
2006
 
Type Article
 
Identifier APPLIED SURFACE SCIENCE, 253(4), 2310-2314
0169-4332
http://dx.doi.org/10.1016/j.apsusc.2006.04.048
http://dspace.library.iitb.ac.in/xmlui/handle/10054/6657
http://hdl.handle.net/10054/6657
 
Language en