Human serum albumin (HSA) adsorption onto a-SiC : H thin films deposited by hot wire chemical vapor deposition
DSpace at IIT Bombay
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Title |
Human serum albumin (HSA) adsorption onto a-SiC : H thin films deposited by hot wire chemical vapor deposition
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Creator |
SWAIN, BP
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Subject |
tissue-culture polystyrene
amorphous-silicon carbide vitronectin fibrinogen surfaces attachment interface binding hwcvd hwcvd ftir xps afm contact angle |
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Description |
In the present paper, we report the study of the adsorption behavior of human serum albumin (HSA) onto surfaces of a-SiC:H thin films deposited by using the hot wire chemical vapor deposition (HWCVD) technique. The surface composition and surface energy of the various substrates as well as the evaluation of the adsorbed amount of protein has been carried out by means of X-ray photoelectron spectroscopy (XPS), Fourier transform infra-red (FTIR) spectroscopy, AFM and contact angle measurements. At the immediate effect of HSA interaction with a-SiC:H films N is adsorbed on the surface and stabilized after 3 days. Preliminary observation found that Si and O atom are desorbed from the surface while C and N set adsorbed to the surface of the a-SiC:H film. (c) 2006
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Publisher |
ELSEVIER SCIENCE BV
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Date |
2011-07-25T06:06:54Z
2011-12-26T12:50:00Z 2011-12-27T05:35:54Z 2011-07-25T06:06:54Z 2011-12-26T12:50:00Z 2011-12-27T05:35:54Z 2006 |
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Type |
Article
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Identifier |
APPLIED SURFACE SCIENCE, 253(4), 2310-2314
0169-4332 http://dx.doi.org/10.1016/j.apsusc.2006.04.048 http://dspace.library.iitb.ac.in/xmlui/handle/10054/6657 http://hdl.handle.net/10054/6657 |
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Language |
en
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