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Relationship Between Pack Chemistry and Growth of Silicide Coatings on Mo-TZM Alloy

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Field Value
 
Title Relationship Between Pack Chemistry and Growth of Silicide Coatings on Mo-TZM Alloy
 
Creator MAJUMDAR, S
SHARMA, I
SAMAJDAR, I
BHARGAVA, P
 
Subject high-temperature oxidation
si-b alloys
resistant coatings
intermetallic alloys
behavior
cementation
steels
molybdenum
kinetics
mosi2
 
Description A theoretical model equation has been derived to relate the growth kinetics of silicide coating with the pack chemical composition and other processing conditions for siliconizing of Mo-TZM (Mo-0.5Ti-0.1Zr-0.02C) alloy to improve its oxidation resistance at high temperatures. A series of experiments conducted with varying pack Si (1-10 wt %) and NH4F (2-20 wt %) content, time (1-25 h), and temperature (800-1200 degrees C) confirmed the validity of the model. MoSi2 was the main coating layer formed during the siliconizing process. Optimum processing conditions were derived for doping of Al in MoSi2 to form Mo(Si,Al)(2) in the outer layer of the coating. (C) 2008 The Electrochemical Society. [DOI: 10.1149/1.2987954] .
 
Publisher ELECTROCHEMICAL SOC INC
 
Date 2011-07-21T14:53:44Z
2011-12-26T12:52:03Z
2011-12-27T05:38:59Z
2011-07-21T14:53:44Z
2011-12-26T12:52:03Z
2011-12-27T05:38:59Z
2008
 
Type Article
 
Identifier JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 155(12), D734-D741
0013-4651
http://dx.doi.org/10.1149/1.2987954
http://dspace.library.iitb.ac.in/xmlui/handle/10054/5899
http://hdl.handle.net/10054/5899
 
Language en