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Effect of 80 keV Ar+ implantation on the properties of pulse laser deposited magnetite (Fe3O4) thin films

DSpace at IIT Bombay

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Title Effect of 80 keV Ar+ implantation on the properties of pulse laser deposited magnetite (Fe3O4) thin films
 
Creator LANKE, UD
 
Subject verwey transition
temperature
implantation
magnetite
thin films
pulsed laser ablation
verwey transition
 
Description Highly oriented thin films of Fe3O4 were deposited on (100) LaAlO3 substrates by pulsed laser ablation. The structural quality of the films was confirmed by X-ray diffraction (XRD). The films showed a Verwey transition near 120 K. The films were subjected to 80 keV Ar+ implantation at different ion doses up to a maximum of 6 x 10(14) ions/cm(2). Ion beam induced modifications in the films were investigated using XRD and resistance vs temperature measurements. Implantation decreases the change in resistance at 120 K and this effect saturates beyond 3 x 10(14) ions/cm(2). The Yerwey transition temperature, T-v, shifts towards lower temperatures with increase in ion dose.
 
Publisher INDIAN ACADEMY SCIENCES
 
Date 2011-08-02T02:16:23Z
2011-12-26T12:53:37Z
2011-12-27T05:40:17Z
2011-08-02T02:16:23Z
2011-12-26T12:53:37Z
2011-12-27T05:40:17Z
2001
 
Type Article
 
Identifier BULLETIN OF MATERIALS SCIENCE, 24(1), 35-38
0250-4707
http://dx.doi.org/10.1007/BF02704837
http://dspace.library.iitb.ac.in/xmlui/handle/10054/8623
http://hdl.handle.net/10054/8623
 
Language en