Record Details

DETERMINATION OF THE STOICHIOMETRY OF VANADIUM NITRIDE FILMS BY PROTON BACKSCATTERING

DSpace at IIT Bombay

View Archive Info
 
 
Field Value
 
Title DETERMINATION OF THE STOICHIOMETRY OF VANADIUM NITRIDE FILMS BY PROTON BACKSCATTERING
 
Creator RAMANA, JV
RAJU, VS
RAY, AK
GANGADHARAN, S
SRINIVASA, RS
CHANDORKAR, AN
 
Subject backscattering
tin
 
Description Vanadium nitride films were grown on stainless steel and silicon, with different nitrogen concentrations by varying the partial pressures of nitrogen in a DC magnetron sputtering set-up. These films were characterized for their composition by proton back-scattering and their micro hardness values were correlated with their N/V ratio.
 
Publisher AKADEMIAI KIADO
 
Date 2011-07-12T20:31:09Z
2011-12-26T12:47:48Z
2011-12-27T05:40:18Z
2011-07-12T20:31:09Z
2011-12-26T12:47:48Z
2011-12-27T05:40:18Z
1993
 
Type Article
 
Identifier JOURNAL OF RADIOANALYTICAL AND NUCLEAR CHEMISTRY-ARTICLES, 174(2), 265-270
0236-5731
http://dx.doi.org/10.1007/BF02037913
http://dspace.library.iitb.ac.in/xmlui/handle/10054/3609
http://hdl.handle.net/10054/3609
 
Language en