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A kinetic model for iron aluminide coatings by low-pressure chemical vapor deposition - Part I. Deposition kinetics

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Title A kinetic model for iron aluminide coatings by low-pressure chemical vapor deposition - Part I. Deposition kinetics
 
Creator JOHN, JT
SRINIVASA, RS
DE, PK
 
Subject high-temperature
diffusion coatings
steel
nickel
layer
cvd
304-stainless-steel
interdiffusion
system
alloys
coatings
aluminizing
diffusion
chemical vapor deposition
 
Description Kinetics of formation of iron aluminide diffusion coatings by chemical vapor deposition (CVD) on pur e iron was studied in the temperature range 1173-1373 K. AlCl3 vapor, produced by the sublimation of anhydrous aluminum chloride, was used for transporting aluminum from an aluminum source (pure aluminum) in the CVD reactor to the substrate to produce the coating. The reactor pressure was maintained at 1.33 +/- 0.133 kPa. The first step in developing a theoretical model for the coating process is to establish the kinetics of the process. This was accomplished by monitoring the weight gain and thickness as a function of time and temperature. The growth followed a parabolic rate law with the rate constant (by weight gain) steadily increasing with substrate temperature from 0.0114 mg(2) cm(-4) s(-1) at 1198 K to 0.0836 mg(2) cm(-4) s(-1) at 1348 K. The rate constants were 4.138 x 10(-6) and 6.554 x 10(-6) mm(2) s(-1) (by thickness) at substrate temperatures 1273 and 1323 K, respectively. The activation energy for the coating process was 211 +/- 8 kJ mol(-1). (C) 2004
 
Publisher ELSEVIER SCIENCE SA
 
Date 2011-07-27T14:37:01Z
2011-12-26T12:57:27Z
2011-12-27T05:41:18Z
2011-07-27T14:37:01Z
2011-12-26T12:57:27Z
2011-12-27T05:41:18Z
2004
 
Type Article
 
Identifier THIN SOLID FILMS, 466(1-2), 339-346
0040-6090
http://dx.doi.org/10.1016/j.tsf.2004.02.042
http://dspace.library.iitb.ac.in/xmlui/handle/10054/7249
http://hdl.handle.net/10054/7249
 
Language en