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Structure and stability of 2.4 nm period amorphous Ni–Nb/C multilayers

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Field Value
 
Title Structure and stability of 2.4 nm period amorphous Ni–Nb/C multilayers
 
Creator VITTA, SATISH
 
Subject laser ablation
multilayers
nickel alloys
pulsed laser applications
 
Description Amorphous Ni–Nb/C multilayers with a period of 2.4 nm were prepared by pulsed laser ablation deposition. The as-deposited multilayers were found to have an interdiffused Ni1/3Nb1/3C1/3 layer present at the two interfaces; Ni1/2Nb1/2/C and C/N1/2Nb1/2. The specular reflectivity and diffuse scattering studies show that the interface roughness is chemical and not morphological in origin. The structural studies performed using X-ray scattering techniques after a period of 2.5 years from deposition show that the behaviour does not change with time. These results indicate that the multilayered structure is temporally stable in spite of the strong composition dependent driving force for chemical homogenization. The structural stability against homogenization is due to the presence of an amorphous Ni1/3Nb1/3C1/3 layer present at the interfaces which acts as a diffusion barrier.
 
Publisher Elsevier
 
Date 2009-06-13T05:14:36Z
2011-12-08T07:58:11Z
2011-12-26T13:02:32Z
2011-12-27T05:48:58Z
2009-06-13T05:14:36Z
2011-12-08T07:58:11Z
2011-12-26T13:02:32Z
2011-12-27T05:48:58Z
1999
 
Type Article
 
Identifier Materials Science and Engineering B 57(2), 165-169
0921-5107
10.1016/S0921-5107(98)00419-X
http://hdl.handle.net/10054/1478
http://dspace.library.iitb.ac.in/xmlui/handle/10054/1478
 
Language en