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Effect of H2 dilution on Cat-CVD a-SiC:H films

DSpace at IIT Bombay

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Field Value
 
Title Effect of H2 dilution on Cat-CVD a-SiC:H films
 
Creator SWAIN, BIBHU P
GUNDU RAO, TK
ROY, MAINAK
GUPTA, JAGANNATH
DUSANE, RO
 
Subject amorphous material
fourier transform infrared spectroscopy
graphite
raman spectra
 
Description Effect of hydrogen (H2) dilution of the Silane (SiH4), acetylene (C2H2) gas mixture during the deposition of hydrogenated amorphous silicon carbon alloy (a-SiC:H) films by Cat-CVD process shows that the H2 dilution induced additional carbon incorporation, leading to an increase of the carbon content in the films from 52% to 70% for the maximum H2 dilution employed. A slight increase in graphitic carbon in the films deposited with H2 dilution is also observed. A drastic increase in the optical band gap Eg from 2.5 eV for zero dilution to 3.5 eV is observed for a H2 dilution of 10 sccm. Raman spectra for the films deposited with increasing H2 dilution indicate structural changes in the amorphous network associated with increasing graphitic carbon.
 
Publisher Elsevier
 
Date 2009-06-30T07:03:15Z
2011-11-25T15:03:32Z
2011-12-26T13:05:06Z
2011-12-27T05:51:12Z
2009-06-30T07:03:15Z
2011-11-25T15:03:32Z
2011-12-26T13:05:06Z
2011-12-27T05:51:12Z
2006
 
Type Article
 
Identifier Thin Solid Films 501(1-2), 173-176
0040-6090
http://dx.doi.org/10.1016/j.tsf.2005.07.183
http://hdl.handle.net/10054/1581
http://dspace.library.iitb.ac.in/xmlui/handle/10054/1581
 
Language es