Effect of substrate temperature on the structure and optical properties of ZnO thin films deposited by reactive rf magnetron sputtering
DSpace at IIT Bombay
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Title |
Effect of substrate temperature on the structure and optical properties of ZnO thin films deposited by reactive rf magnetron sputtering
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Creator |
SINGH, SUKHVINDER
SRINIVASA, RS MAJOR, SS |
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Subject |
raman spectroscopy
magnetron sputtering optical properties oxide films |
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Description |
Zinc Oxide films were deposited on quartz substrates by reactive rf magnetron sputtering of zinc target. The effect of substrate temperature on the crystallinity and band edge luminescence has been studied. The films deposited at 300 °C exhibited the strongest c-axis orientation. AFM and Raman studies indicated that the films deposited at 600 °C possess better overall crystallinity with reduction of optically active defects, leading to strong and narrow PL emission.
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Publisher |
Elsevier
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Date |
2009-03-19T07:24:57Z
2011-11-25T19:36:50Z 2011-12-26T13:07:32Z 2011-12-27T05:55:34Z 2009-03-19T07:24:57Z 2011-11-25T19:36:50Z 2011-12-26T13:07:32Z 2011-12-27T05:55:34Z 2007 |
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Type |
Article
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Identifier |
Thin Solid Films 515(24), 8718-8722
0040-6090 http://dx.doi.org/10.1016/j.tsf.2007.03.168 http://hdl.handle.net/10054/1001 http://dspace.library.iitb.ac.in/xmlui/handle/10054/1001 |
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Language |
en
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