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Effect of substrate temperature on the structure and optical properties of ZnO thin films deposited by reactive rf magnetron sputtering

DSpace at IIT Bombay

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Field Value
 
Title Effect of substrate temperature on the structure and optical properties of ZnO thin films deposited by reactive rf magnetron sputtering
 
Creator SINGH, SUKHVINDER
SRINIVASA, RS
MAJOR, SS
 
Subject raman spectroscopy
magnetron sputtering
optical properties
oxide films
 
Description Zinc Oxide films were deposited on quartz substrates by reactive rf magnetron sputtering of zinc target. The effect of substrate temperature on the crystallinity and band edge luminescence has been studied. The films deposited at 300 °C exhibited the strongest c-axis orientation. AFM and Raman studies indicated that the films deposited at 600 °C possess better overall crystallinity with reduction of optically active defects, leading to strong and narrow PL emission.
 
Publisher Elsevier
 
Date 2009-03-19T07:24:57Z
2011-11-25T19:36:50Z
2011-12-26T13:07:32Z
2011-12-27T05:55:34Z
2009-03-19T07:24:57Z
2011-11-25T19:36:50Z
2011-12-26T13:07:32Z
2011-12-27T05:55:34Z
2007
 
Type Article
 
Identifier Thin Solid Films 515(24), 8718-8722
0040-6090
http://dx.doi.org/10.1016/j.tsf.2007.03.168
http://hdl.handle.net/10054/1001
http://dspace.library.iitb.ac.in/xmlui/handle/10054/1001
 
Language en