Thinning of multilayer graphene to monolayer graphene in a plasma environment
DSpace at IIT Bombay
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Title |
Thinning of multilayer graphene to monolayer graphene in a plasma environment
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Creator |
HAZRA, KS
RAFIEE, J RAFIEE, MA MATHUR, A ROY, SS MCLAUHGLIN, J KORATKAR, N MISRA, DS |
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Subject |
GRAPHITE OXIDE
SINGLE-LAYER FILMS PHASE KINETICS SHEETS GAS |
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Description |
We present a facile approach to transform multilayer graphene to single-layer graphene in a gradual thinning process. Our technique is based upon gradual etching of multilayer graphene in a hydrogen and nitrogen plasma environment. High resolution transmission microscopy, selected area electron diffraction and Raman spectroscopy confirm the transformation of multilayer graphene to monolayer graphene at a substrate temperature of similar to 400 degrees C. The shift in the position of the G-band peak shows a perfect linear dependence with substrate temperature, which indicates a controlled gradual etching process. Selected area electron diffraction also confirmed the removal of functional groups from the graphene surface due to the plasma treatment. We also show that plasma treatment can be used to engineer graphene nanomesh structures.
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Publisher |
IOP PUBLISHING LTD
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Date |
2012-06-26T10:06:28Z
2012-06-26T10:06:28Z 2011 |
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Type |
Article
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Identifier |
NANOTECHNOLOGY,22(2)-
0957-4484 http://dx.doi.org/10.1088/0957-4484/22/2/025704 http://dspace.library.iitb.ac.in/jspui/handle/100/14363 |
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Language |
English
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