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Thinning of multilayer graphene to monolayer graphene in a plasma environment

DSpace at IIT Bombay

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Title Thinning of multilayer graphene to monolayer graphene in a plasma environment
 
Creator HAZRA, KS
RAFIEE, J
RAFIEE, MA
MATHUR, A
ROY, SS
MCLAUHGLIN, J
KORATKAR, N
MISRA, DS
 
Subject GRAPHITE OXIDE
SINGLE-LAYER
FILMS
PHASE
KINETICS
SHEETS
GAS
 
Description We present a facile approach to transform multilayer graphene to single-layer graphene in a gradual thinning process. Our technique is based upon gradual etching of multilayer graphene in a hydrogen and nitrogen plasma environment. High resolution transmission microscopy, selected area electron diffraction and Raman spectroscopy confirm the transformation of multilayer graphene to monolayer graphene at a substrate temperature of similar to 400 degrees C. The shift in the position of the G-band peak shows a perfect linear dependence with substrate temperature, which indicates a controlled gradual etching process. Selected area electron diffraction also confirmed the removal of functional groups from the graphene surface due to the plasma treatment. We also show that plasma treatment can be used to engineer graphene nanomesh structures.
 
Publisher IOP PUBLISHING LTD
 
Date 2012-06-26T10:06:28Z
2012-06-26T10:06:28Z
2011
 
Type Article
 
Identifier NANOTECHNOLOGY,22(2)-
0957-4484
http://dx.doi.org/10.1088/0957-4484/22/2/025704
http://dspace.library.iitb.ac.in/jspui/handle/100/14363
 
Language English