Facile one-step transfer process of graphene
DSpace at IIT Bombay
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Title |
Facile one-step transfer process of graphene
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Creator |
BAJPAI, R
ROY, S JAIN, L KULSHRESTHA, N HAZRA, KS MISRA, DS |
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Subject |
FEW-LAYER GRAPHENE
CHEMICAL-VAPOR-DEPOSITION RAMAN-SPECTROSCOPY SINGLE-LAYER HIGH-QUALITY LARGE-AREA FILMS NANOTUBES |
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Description |
Chemical vapour deposition (CVD) is emerging as a popular method for growing large-area graphene on metal substrates. For transferring graphene to other substrates the technique generally used involves deposition of a polymer support with subsequent etching of the metal substrate. Here we report a simpler one-step transfer process. Few-layer graphene (FLG) grown on a Cu substrate were transferred to a silanized wafer by just pressing them together. Hydrogen bonding between the hydroxyl group on FLG and the amine group on silane molecules facilitate the transfer.
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Publisher |
IOP PUBLISHING LTD
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Date |
2012-06-26T10:06:59Z
2012-06-26T10:06:59Z 2011 |
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Type |
Article
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Identifier |
NANOTECHNOLOGY,22(22)-
0957-4484 http://dx.doi.org/10.1088/0957-4484/22/22/225606 http://dspace.library.iitb.ac.in/jspui/handle/100/14364 |
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Language |
English
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