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On the evolution of cured voxel in bulk photopolymerization upon focused Gaussian laser exposure

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Title On the evolution of cured voxel in bulk photopolymerization upon focused Gaussian laser exposure
 
Creator BHOLE, K
GANDHI, P
KUNDU, T
 
Subject MICROSCALE TRUSS STRUCTURES
INCOHERENT WHITE-LIGHT
POLYMER WAVE-GUIDES
FLOW LITHOGRAPHY
STEREOLITHOGRAPHY
RESIN
MASK
SOLIDIFICATION
INTERFERENCE
INHIBITION
 
Description Unconstrained depth photopolymerization is emerging as a promising technique for fabrication of several polymer microstructures such as self propagating waveguides, 3D freeform structures by bulk lithography, and polymer nanoparticles by flash exposure. Experimental observations reveal governing physics beyond Beer Lambert's law and scattering effects. This paper seeks to model unconstrained depth photopolymerization using classical nonlinear Schrodinger equation coupled with transient diffusion phenomenon. The beam propagation part of the proposed model considers scattering effects induced due to spatial variation of the refractive index as a function of the beam intensity. The critical curing energy model is used to further predict profile of polymerized voxel. Profiles of photopolymerized voxel simulated using proposed model are compared with the corresponding experimental results for several cases of exposure dose and duration. The comparison shows close match leading to conclusion that the experimentally observed deviation from Beer Lambert's law is indeed due to combined effect of diffusion of photoinitiator and scattering of light because of change in the refractive index. (C) 2014 AIP Publishing LLC.
 
Publisher AMER INST PHYSICS
 
Date 2014-12-28T11:00:22Z
2014-12-28T11:00:22Z
2014
 
Type Article
 
Identifier JOURNAL OF APPLIED PHYSICS, 116(4)
0021-8979
1089-7550
http://dx.doi.org/10.1063/1.4891109
http://dspace.library.iitb.ac.in/jspui/handle/100/16303
 
Language English