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Studies on Electrodeposited NiS Thin Films

DSpace at IIT Bombay

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Title Studies on Electrodeposited NiS Thin Films
 
Creator BHARATHI, B
THANIKAIKARASAN, S
CHANDRASEKAR, PV
KOLLU, P
MAHALINGAM, T
IXTLILCO, L
 
Subject Thin Films
NiS
Electrodeposition
Semiconductor
IONIC LAYER ADSORPTION
SOLUTION PH
GROWTH
DEPOSITION
 
Description Thin films of NiS have been deposited on indium doped tin oxide coated conducting glass substrates using electrodeposition technique. Structural studies revealed that the deposited films exhibit hexagonal structure with preferential orientation along (002) plane. Structural parameters such as crystallite size, strain and dislocation density are calculated for films with different thickness values obtained at various deposition time. The film composition and surface morphology have been analyzed using scanning electron microscopy and energy dispersive analysis by X-rays. Optical absorption analysis showed that the deposited films possess band gap value around 0.7 eV.
 
Publisher ECOLE POLYTECHNIQUE MONTREAL
 
Date 2014-12-29T06:39:58Z
2014-12-29T06:39:58Z
2014
 
Type Article
 
Identifier JOURNAL OF NEW MATERIALS FOR ELECTROCHEMICAL SYSTEMS, 17(3)167-171
1480-2422
http://dspace.library.iitb.ac.in/jspui/handle/100/17332
 
Language English