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Nanostructured Anodic Multilayer Dielectric Stacked Metal-Insulator-Metal Capacitors

DSpace at IIT Bombay

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Title Nanostructured Anodic Multilayer Dielectric Stacked Metal-Insulator-Metal Capacitors
 
Creator KARTHIK, R
KANNADASSAN, D
BAGHINI, MS
MALLICK, PS
 
Subject TANTALUM SUPERIMPOSED LAYERS
O-18 TRACING TECHNIQUES
MIM CAPACITORS
NUCLEAR MICROANALYSIS
ELECTRICAL CHARACTERIZATION
GATE DIELECTRICS
ALUMINUM-OXIDE
ANODIZATION
OXIDATION
NIOBIUM
Al2O3
Anodization
High-k
Leakage Mechanisms
Metal-Insulator-Metal (MIM)
Multilayer
Quadratic Voltage Coefficient of Capacitance
TiO2
 
Description This paper presents the fabrication of Al2O3/TiO2/Al2O3 metal-insulator-metal (MIM) capacitor using anodization technique. High capacitance density of >3.5 fF/mu m(2), low quadratic voltage coefficient of capacitance of
 
Publisher AMER SCIENTIFIC PUBLISHERS
 
Date 2016-01-15T10:02:14Z
2016-01-15T10:02:14Z
2015
 
Type Article
 
Identifier JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 15(12)9938-9943
1533-4880
1533-4899
http://dx.doi.org/10.1166/jnn.2015.11636
http://dspace.library.iitb.ac.in/jspui/handle/100/18319
 
Language en