Record Details


Field	Value

Title	Effect of growth parameters on structural, electrical and optical properties of titanium oxide thin films

Creator	Sankar, S Gopchandran, K G

Subject	Titanium oxide films Thin films Optical constant Optical transmittance

Description	791-796 Semi-transparent and highly conducting nanostructured titanium oxide thin films have been prepared using pulsed laser deposition technique. Films deposited on quartz substrates, kept at 773 K, are shown to have resistivity of 2.9x10⁻⁴ Ω m and a maximum optical transmittance of 50%. The characterizations of the films are done with X-ray diffraction, Raman spectroscopy, Scanning electron microscopy, UV-visible spectroscopy and conductivity measurements. Eventhough annealing transformed the films from amorphous to nanocrystalline phase with preferential growth along (110) plane of the rutile TiO₂, the grain size as well as the voids between the grains after transformation, have been seen to be governed by the kinetics and thermodynamics during deposition of the films. The optical transmittances of the films have been found to increase with annealing temperature. Optical constants are derived from the transmission spectra and the refractive index dispersion has been discussed in terms of the single oscillator-Wemple and Didomenico model.

Date	2008-12-15T09:28:20Z 2008-12-15T09:28:20Z 2008-11

Type	Article

Identifier	0019-5596 http://hdl.handle.net/123456789/2598

Language	en_US

Publisher	CSIR

Source	IJPAP Vol.46(11)) [November 2008]

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