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<strong>Nanoindentation study on nitrogenated tetrahedral amorphous carbon thin films with ultra low load</strong>

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Title Statement <strong>Nanoindentation study on nitrogenated tetrahedral amorphous carbon thin films with ultra low load</strong>
 
Added Entry - Uncontrolled Name Tripathi, Ravi Kant
Panwar, O S; CSIR-National Physical Laboratory,
Chockalingam, Sreekumar
 
Uncontrolled Index Term specific instrumentation and techniques of general use in physics
Thin films; Arc discharges; Nanoindentation; Nanomechanical properties
 
Summary, etc. This paper reports the improved nanomechanical properties of as grown and nitrogen incorporated tetrahedral amorphous carbon (ta-C, ta-C: N) films deposited by S-bend filtered cathodic vacuum arc (FCVA) technique using nanoindentation. The effect of varying amount of nitrogen incorporation on the nanomechanical properties of ta-C films deposited at a high substrate bias of -300 V at ultra low load of 1.4 mN has been studied. It has been found that the nitrogenation has improved the mechanical properties of ta-C films. The hardness <em>H</em> of 27.8 GPa with improvement of ~30 % and plastic index parameter (ratio of <em>H</em> to elastic modulus <em>E</em>) (<em>H</em>/<em>E</em>) of 0.091 with improvement of ~ 25 % has been obtained for ta-C: N films deposited at a nitrogen partial pressure of 1.9 10<sup>-2</sup> Pa. Improved <em>H</em> and <em>H</em>/<em>E</em> of ta-C: N films may be due to the better ionization and incorporation of nitrogen in a carbon matrix at the high negative substrate bias used in the deposition of FCVA technique.
 
Publication, Distribution, Etc. Indian Journal of Pure & Applied Physics (IJPAP)
2016-09-22 14:14:31
 
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http://op.niscair.res.in/index.php/IJPAP/article/view/9881
 
Data Source Entry Indian Journal of Pure & Applied Physics (IJPAP); ##issue.vol## 54, ##issue.no## 9 (2016): Indian Journal of Pure & Applied Physics
 
Language Note en
 
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