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<strong>Characteristics of nanocrystalline CeO2 thin films deposited on different substrates at room temperature</strong>

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Title Statement <strong>Characteristics of nanocrystalline CeO2 thin films deposited on different substrates at room temperature</strong>
 
Added Entry - Uncontrolled Name Srivatsa, KMK ; CSIR-National Physical Laboratory
Chaturvedi, Lakshita ; Advanced Materials and Devices Division, Council of Scientific & Industrial Research (CSIR) - National Physical Laboratory, Dr. K.S. Krishnan Marg, New Delhi-110012, India.
Howlader, Smita ; Advanced Materials and Devices Division, Council of Scientific & Industrial Research (CSIR) - National Physical Laboratory, Dr. K.S. Krishnan Marg, New Delhi-110012, India
Chhikara, Deepak ; Advanced Materials and Devices Division, Council of Scientific & Industrial Research (CSIR) - National Physical Laboratory, Dr. K.S. Krishnan Marg, New Delhi-110012, India
Singh, Preetam ; Advanced Materials and Devices Division, Council of Scientific & Industrial Research (CSIR) - National Physical Laboratory, Dr. K.S. Krishnan Marg, New Delhi-110012, India
Bagga, Shobi ; Centre of Nanotechnology, Rajasthan Technical University, Kota -324010, India.
Department of Science and Technology (DST) through SERB, New Delhi, India
 
Uncontrolled Index Term Structural; Optical; wettable properties
Nanocrystalline; CeO2 thin films; Room temperature; Magnetron sputtering; Optical properties; Wettability
 
Summary, etc. Nanocrystalline cerium oxide (CeO<sub>2</sub>) thin films have been deposited over Si (100), Ni-W (200) and Al<sub>2</sub>O<sub>3</sub> (0006) substrates at room temperature by RF magnetron sputtering. The effect of RF sputtering power and deposition pressure on the optical and wettable properties of CeO<sub>2</sub> thin films has been investigated. X-ray diffraction patterns show the dominant single orientation (111) of CeO<sub>2 </sub> thin films deposited on different substrates at 150 W applied RF power and 5mTorr deposition pressure.But the value of full width at half maxima is found to be different on different substrates and varies in the range from 0.47°-0.65°. The corresponding crystallite size is also found to be varying from 16.94-12.46 nm. For these deposition parameters ellipsometer results reveal that the refractive index and band gap values are close to that of standard values. Thus, our results demonstrate that following sputtering process it is possible to deposit highly crystalline single oriented (111) CeO<sub>2</sub> thin films over different substrates even at room temperature simply by optimizing process parameters. Further, contact angle measurements indicate that all the deposited CeO<sub>2</sub> films show hydrophobic in nature.
 
Publication, Distribution, Etc. Indian Journal of Pure & Applied Physics (IJPAP)
2017-10-09 09:45:39
 
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http://op.niscair.res.in/index.php/IJPAP/article/view/16349
 
Data Source Entry Indian Journal of Pure & Applied Physics (IJPAP); ##issue.vol## 55, ##issue.no## 9 (2017): Indian Journal of Pure & Applied Physics
 
Language Note en
 
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