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<p><strong>Fabrication and characterization of thermally oxidized TiO2 thin films on Si(100) substrates</strong></p>

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Title Statement <p><strong>Fabrication and characterization of thermally oxidized TiO2 thin films on Si(100) substrates</strong></p>
 
Added Entry - Uncontrolled Name Bhatta, Umananda M; Centre for Incubation Innovation Research and Consultancy, Jyothy Institute of Technology, Bengaluru
Guha, Puspendu ; Institute of Physics, Sachivalaya Marg, Bhubaneswar 751 005, India
Kumar G, Susheel ; Centre for Incubation, Innovation, Research and Consultancy, Jyothy Institute of Technology, Bengaluru 560 082, India
R M, Nagabharana ; Centre for Incubation, Innovation, Research and Consultancy, Jyothy Institute of Technology, Bengaluru 560 082, India
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Uncontrolled Index Term Thermal oxidation; TiO2; Mixed phase; HRTEM; Moiré fringes
 
Summary, etc. Mixed phase TiO<sub>2</sub> is known to have better photocatalytic property as the resulting grain boundaries and interfaces between substrate, anatase and rutile phases play a crucial role in transferring/trapping photogenerated electrons. Here we have grown three different thicknesses (10 nm, 30 nm and 50 nm) of Ti thin films on Si(100) substrate in a sputter coater. Thermal oxidation in air at 600 °C for 1 h leads to the formation of mixed phase TiO<sub>2</sub> thin films. Surface morphology and crystalline quality of thin film are discussed using XRD, SEM and TEM results. Moiré fringes resulting from interfacial strain have been discussed using lattice resolved HRTEM images.
 
Publication, Distribution, Etc. Indian Journal of Pure & Applied Physics (IJPAP)
2019-11-18 12:17:44
 
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http://op.niscair.res.in/index.php/IJPAP/article/view/23114
 
Data Source Entry Indian Journal of Pure & Applied Physics (IJPAP); ##issue.vol## 57, ##issue.no## 10 (2019): Indian Journal of Pure & Applied Physics
 
Language Note en
 
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