<strong>Design of SOI MOSFETs for Analog/RF Circuits</strong>
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Authentication Code |
dc |
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Title Statement |
<strong>Design of SOI MOSFETs for Analog/RF Circuits</strong> |
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Added Entry - Uncontrolled Name |
Adhikari, Manoj Singh; LPU, Phagwara Patel, Raju ; Department of Electronics and Communication Engineering, MBM Engineering College, Jodhpur, India Lata Tripathi, Suman ; School of Electronics and Electrical Engineering, Lovely Professional University, Punjab, India Singh, Yashvir ; Department of Electronics and Communication Engineering, G B Pant Institute of Engineering & Technology, Pauri, India |
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Uncontrolled Index Term |
specific instrumentation and techniques of general use in physics; elementary particles and fields. Trench-gate; MOSFET; Breakdown voltage; Transconductance; High-frequency |
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Summary, etc. |
In this paper, the concept of integration of a high voltage trench MOSFET (HVT MOSFET) and low voltage trench MOSFET (LVT MOSFET) is proposed. Insulator (Dielectric) isolation technique is used for the implementation of HVT and LVT MOSFETs on Silicon-on-Insulator (SOI) layer side by side. The HVT MOSFET consists of two gates which are placed in separate trenches in the drift region. The proposed structure minimizes ON-resistance (R<sub>on</sub>) along with increased breakdown voltage (V<sub>br</sub>) due to reduced electric field, creation of dual channels, and folding of drift region in vertical direction. In HVT MOSFET, the drain current (I<sub>D</sub>) increases leading to enhanced trans conductance (g<sub>m</sub>) by simultaneous conduction of channels which improves the cut-off frequency (f<sub>t</sub>) and maximum oscillation frequency (f<sub>max</sub>). On the other side, LVT MOSFET consists of a gate placed within a SiO<sub>2</sub> trench to create two channels on either side of gate. The parallel conduction of two channels provides enhancement in I<sub>D</sub>, g<sub>m, </sub>f<sub>max</sub> and f<sub>t</sub>. The performance analysis of HVT MOSFET and LVT MOSFET is carried out using 2D simulation in the device simulator (ATLAS). |
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Publication, Distribution, Etc. |
Indian Journal of Pure & Applied Physics (IJPAP) 2020-09-26 12:43:01 |
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Electronic Location and Access |
application/pdf http://op.niscair.res.in/index.php/IJPAP/article/view/31374 |
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Data Source Entry |
Indian Journal of Pure & Applied Physics (IJPAP); ##issue.vol## 58, ##issue.no## 9 (2020): Indian Journal of Pure & Applied Physics |
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Language Note |
en |
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Nonspecific Relationship Entry |
http://op.niscair.res.in/index.php/IJPAP/article/download/31374/465496530 |
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Terms Governing Use and Reproduction Note |
Except where otherwise noted, the Articles on this site are licensed under Creative Commons License: CC Attribution-Noncommercial-No Derivative Works 2.5 India © 2015. The Council of Scientific & Industrial Research, New Delhi. |
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