ICAR Research Data Repository for Knowledge Management
Theoretical Analysis of Plasma Parameters on Film Deposition in planer and Cylindrical Magnetron Sputtering
NOPR - NISCAIR Online Periodicals Repository
View Archive Info| Field | Value | |
| Title |
Theoretical Analysis of Plasma Parameters on Film Deposition in planer and Cylindrical Magnetron Sputtering
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| Creator |
Gupta, Gaurav
Tyagi, R K |
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| Subject |
Coating
Morphology Plasma Sputtering Surface |
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| Description |
174-179
Thin film deposition using plasma sputter is done by experimental methods, though Numerical simulation and theory are capable of generating realistic and useful results. In present exploration a theoretical model for sputtering with consequence of different plasma parameters with the help of electromagnetic lenses for planar (Tp) and cylindrical (Tc) magnetron sputteringhas been conversed. The plasma of helium gas on nickel metal objectwhich contains the velocity shear instability is considered, and Tp,Tc, under the influence of shear scale length(Ai), homogeneous DC electric field(E0), magnetic field (B0), density gradient (ɛnρi) have been evaluated. Tp, and Tcare found to be maximum in the range of 0.815–0.91, and 0.57–0.90, respectively. Also growth rate showed direct relation to E0 and Ai but inversely varies with B0 and ɛnρi. |
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| Date |
2021-03-16T07:18:54Z
2021-03-16T07:18:54Z 2021-03 |
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| Type |
Article
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| Identifier |
0975-0959 (Online); 0301-1208 (Print)
http://nopr.niscair.res.in/handle/123456789/56518 |
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| Language |
en_US
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| Rights |
 CC Attribution-Noncommercial-No Derivative Works 2.5 India
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| Publisher |
NISCAIR-CSIR, India
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| Source |
IJPAP Vol.59(03) [March 2021]
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