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Optimization of structural and optical properties of sputter deposited TiO2 thin films by controlling deposition parameters

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Title Optimization of structural and optical properties of sputter deposited TiO2 thin films by controlling deposition parameters
 
Creator Yadav, Prashant
Sharma, Hitesh Kumar
Singh, Manohar
Malik, Anil Kumar
Singh, Beer Pal
 
Subject Raman Spectroscopy
Thin Films
TiO2
UV –Vis
Spectroscopy
XRD
 
Description 735-739
Titanium oxide (TiO2) thin films have been deposited onto highly cleaned soda lime glass substrates by DC magnetron
reactive sputtering system. The Ti target with purity 99.99% is sputtered by argon gas in the sputtering chamber. Oxygen
gas with purity 99.99% is introduced during the deposition process into the sputtering chamber as reactive gas for the
synthesis of titanium oxide. Structural and optical properties of TiO2 thin films have been characterized by X-ray diffraction
(XRD), Raman spectroscopy and UV-Vis. spectroscopy. The effect of substrate temperature and sputtering power on the
optical properties of TiO2 thin films has been studied. The XRD and Raman spectroscopy of as-deposited films are used to
study the structural properties of TiO2 as a function of substrate temperature and sputtered power. The structural studies
show the crystalline nature of TiO2 thin films. The narrowing of energy band gap of sputtered deposited TiO2thin films was
studied using UV-Vis. spectroscopy.
 
Date 2022-02-02T10:47:04Z
2022-02-02T10:47:04Z
2021-11
 
Type Article
 
Identifier 0975-0991 (Online); 0971-457X (Print)
http://nopr.niscair.res.in/handle/123456789/59046
 
Language en
 
Publisher NIScPR-CSIR, India
 
Source IJCT Vol.28(6) [November 2021]