| |
| Field |
Value |
| |
| Title |
The structural characterisation of HWCVD-deposited nanocrystalline silicon films |
| |
| Names |
SWAIN, BP
|
| Date Issued |
2009 (iso8601) |
| Abstract |
Nanocrystalline silicon (nc-Si) films were deposited by hot-wire chemical vapour deposition (HWCVD) in the presence of varying H, concentrations and their structural and interfacial character investigated by X-ray diffraction, small-angle X-ray scattering (SAXS) and Raman spectroscopy. The crystalline fraction was around 30-50% and the nc-Si crystallite size was in the range 20-35 nm. The SAXS results were analysed by Guinier plot, scaling factor, and correlation distance. The nc-Si grains displayed a mass fractal appearance, and the interfacial inhomogeneity distance was similar to 2 nm. |
| Genre |
Article; Proceedings Paper |
| Topic |
Chemical-Vapor-Deposition |
| Identifier |
SOUTH AFRICAN JOURNAL OF SCIENCE,105,77-80 |
ICAR Research Data Repository for Knowledge Management