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Effect of Gamma Irradiation Induced Modifications in Tungsten Oxide Thin Films and Their Potential Applications

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Title Effect of Gamma Irradiation Induced Modifications in Tungsten Oxide Thin Films and Their Potential Applications
 
Creator Deepika
Gupta, Deepika
Chauhan, Vishnu
Sharma, S K
Kumar, Satyendra
Kumar, Rajesh
 
Subject Thin films
RF Sputtering
Gamma Irradiation
Atomic force microscope (AFM)
X-Ray Diffraction (XRD)
Raman Spectroscopy
 
Description 409-415
In this work, we study the effect of high gamma doses (600 kGy, 1000 kGy and 1250 kGy) on morphological, structural and optical characteristics of sputtered WO3 thin films. The modifications in these characteristics were analyzed by X-Ray Diffraction, Atomic Force Microscope, UV–Visible spectroscopy, Photoluminescence spectroscopy and Raman spectroscopy. AFM shows the variation in grain size from 61 nm to 91.2 nm after gamma irradiation from unirradiated to gamma-exposed WO3 thin films. XRD and Raman spectroscopy show the monoclinic structure before and after irradiation of WO3 thin films. The optical study illustrates the variation in the optical band gap from 2.80 eV to 2.08 eV after gamma exposure of WO3 thin films. In PL spectra, two emission peaks at a wavelength of 410 nm and 480 nm were observed.
 
Date 2023-08-16T12:06:09Z
2023-08-16T12:06:09Z
2023-08
 
Type Article
 
Identifier 0971-4588 (Print); 0975-1017 (Online)
http://nopr.niscpr.res.in/handle/123456789/62442
https://doi.org/10.56042/ijems.v30i3.3787
 
Language en
 
Publisher NIScPR-CSIR, India
 
Source IJEMS Vol.30(3) [June 2023]