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OSL Characteristics of Cu Activated NaLi2PO4 Phosphor

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Title OSL Characteristics of Cu Activated NaLi2PO4 Phosphor
 
Creator Bai, Bhuli
Sahare, P D
 
Subject Optically Stimulated Luminescence (OSL)
Dosimetry
Phosphor
Solid State Diffusion
NaLi2PO4: Cu
Sensitivity
Reusability
Optically Bleaching
 
Description 376-382
Cu-activated NaLi2PO4 phosphor material was successfully synthesized through solid state diffusion method. It was
mainly doped with Cu2Cl2 and CuCl2 salts for impurities in the form of Cu+ and Cu2+ respectively. Powder X-ray Diffraction
(PXRD) was carried out for the confirmation of single phase of synthesized phosphor material. Dosimetric properties of the
material were investigated using the Optically Stimulated (OSL) techniques. We have found maximum sensitivity of
Cu2+: NaLi2PO4 samples at concentration 1000ppm (0.1 mol%) in OSL with annealing temperatures 1073K. Whereas for
Cu+: NaLi2PO4 samples, 873K was considered as the optimization annealing temperature with impurity concentrations
0.08mol%. The phosphor material exhibits good dosimetric characteristics. It was found that NaLi2PO4:Cu2+ is little less
(3 times) and NaLi2PO4: Cu+ is 4.2 times less sensitive than that of STD. Al2O3:C (Landauer Inc., USA) respectively. For
further OSL studies only NaLi2PO4:Cu2+ used. Low TL fading, for NaLi2PO4:Cu2+, only 10.74% fading takes place in
10days after that it negligibly fade. Also, wide OSL dose response (10-15kGy), easy optically bleaching for reusability and
easy to handle are some of the other significant qualities observed in our samples. Simple method of preparation and tissue
equivalence (Zeff~10.8) adds on the advantages of NaLi2PO4: Cu phosphor. This type of phosphor is also suitable for high
energy radiation dosimetry used in OSL techniques.
 
Date 2023-08-16T12:17:13Z
2023-08-16T12:17:16Z
2023-08-16T12:17:13Z
2023-08-16T12:17:16Z
2023-08
 
Type Article
 
Identifier 0971-4588 (Print); 0975-1017 (Online)
http://nopr.niscpr.res.in/handle/123456789/62447
https://doi.org/10.56042/ijems.v30i3.3806
 
Language en
 
Publisher NIScPR-CSIR, India
 
Source IJEMS Vol.30(3) [June 2023]